Artwork Systems Shows Products at Labelexpo 2006
- Published: August 22, 2006, By pffc-online.com
PRESS RELEASE
GHENT, BELGIUM—Artwork Systems will show its expanded product line for label and packaging markets at the upcoming Labelexpo Americas 2006, September 11-14, 2006, at the Donald E. Stevens Convention Center in Rosemont, IL. Additionally, Mike Rottenborn, VP of technical marketing, will be a featured speaker at the September 12 Labelexpo conference session, “Success with prepress—completing the digital workflow.”
Artwork Systems will feature the newest Nexus 8.3 comprehensive high-end workflow solution; Odystar 2.5 for prepress workflow management; PA:CT (Packaging:Certified Technology) for secure, trackable PDF processing in packaging applications; Neo for quick and efficient editing of native PDF files; Concentric Screening, a halftone dot printing technology; and WebWay 4.0, for Internet collaboration with remote users.
